PECVD等离子增强化学气相淀积系统 STS 310 PECVD_allwin21
SYSTEM SPECIFICATION AND TECHNICAL DATA
High Temperature Electrode (allows up to 360 degree C)
Can be configured for 6 x 3",or 4 x 4" wafers
Can be configured for 6 x 3",or 4 x 4" wafers
4" pumping port, throttle valve, high vac valve, foreline.
Current Gas configuration.
Gas lines- MFC are Tylan 2900 type
SF6 or CF4 MFC
N2O MFC
NH3 – 50 sccm, MFC
O2 – 3000 sccm, MFC
SiH4 - 3000sccm MFC
O2 is interlocked from NH3, SiH4 lines
Gas lines- MFC are Tylan 2900 type
SF6 or CF4 MFC
N2O MFC
NH3 – 50 sccm, MFC
O2 – 3000 sccm, MFC
SiH4 - 3000sccm MFC
O2 is interlocked from NH3, SiH4 lines
RF power supply:187.5 KHz, 500 watts output and 13.56MHz watts output. There is a switch for 187.5KHz RF Power 500W to double the frequency to be 375 KHz.Edwa***
E2M40 rotary pump with Edwa*** 250 blower.
本公司可提供涵盖快速退火、去胶、刻蚀、测试等工艺的全新或翻新的半导体设备及备件。通过技艺精湛的设备翻新和***的软件升级及技术测试，可以保证我们的设备具有出色的运作表现，能够满足客户的多种需求，降低客户的生产成本。
本公司有快速退火炉RTP（保护气氛热处理炉）Allwin21 AG610 、 EG2001/2010/1034探针台;HP4062/HP4145测试仪;AW-PCM测试软件；探针台Wentworth MP 2020；PECVD等离子增强化学气相淀积系统 STS 310 PECVD_allwin21等.
公司在北京、南京、广东等地设有办事机构，致力于为客户提供完善的服务与支持。