微电子(单晶硅、多晶硅、太阳能电池、氧化铝坩埚)生产用高纯水系统超纯水设备，余艳13073396006,***:674831270
微电子、电池工业用水处理设备
Pure water for Micro-electronics, batteries industrial
应用领域和指标要求参考
Reference of applicati*** areas and indexes required
用途Applicati*** 用水指标Water Indicators 参考标准Reference standard 单晶硅、多晶硅、太阳能电池、氧化铝坩埚、光伏玻璃等生产 Monocrystalline silicon, polycrystalline silicon, solar cells, alumina crucible, photovoltaic glass, and other production 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 The water quality of China's electronic-grade technical indicators GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor 单晶硅半导体集成电路块，显像管、玻壳、液晶显示器等制造工业 Monocrystalline silicon semiconductor chips, tubes, glass, liquid crystal displays and other manufacturing industries 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specificati*** GB11446-1-1997 光学材料清洗用水、电子陶瓷行业用纯水、***磁性材料用纯水 Pure water for optical materials, electronic ceramics and cutting-edge magnetic materials 电阻率10 ~17 MΩ.CM Resitivity10 ~17 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specificati*** GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor 蓄电池、锂电池、锌锰电池生产 Batteries, lithium batteries, zinc-manganese battery production 电阻率5 ~10 MΩ.CM Resitivity5 ~10 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specificati*** GB11446-1-1997 有色金属、***冶炼用水、纳米级新材料生产用水、航空新材料生产用水、ITO导电玻璃制造用水、电子级无尘布生产用水 Pure water for non-ferrous metals, precious metals ***elting, nano-scale production of new materials, ***iation and production of new materials, ITO conductive glass, production of electronic-grade for dust-free cloth 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specificati*** GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor
主要工艺流程和出水指标：
Main technical process and standard of output water
※预处理+反渗透+离子交换器（电阻率≥15MΩ.CM）
Pre-treatment+ stage reverse o***osis system+ion exchange (electric conductivity≥15MΩ.CM）
※预处理+二级反渗透+EDI（电阻率≥15MΩ.CM）
Pre-treatment+ stage reverse o***osis system+EDI (electric conductivity≥15MΩ.CM）
※ 预处理+二级反渗透+脱气膜+EDI +抛光混床（电阻率≥18.25MΩ.CM）
Pre-treatment+ double stage reverse o***osis system+air film+EDI +polishing mixed bed (electric conductivity≥18.25MΩ.CM）
详情请联系：余艳13073396006,***:674831270）
详细工艺需根据原水设计情况进行设计
Details of the design process should be carried out according to the feed water quality.
纯水设备的主要特点
Main technics of pure water treatment equipment